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81
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
82
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
83
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
84
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Rangaswamy Navamathavan., | 한국물리학회 | 2006 ,
85
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Wonjoon Choi., | 한국물리학회 | 2006 ,
86
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Yong-jin Seo., | 한국물리학회 | 2006 ,
87
An Active Module Using a Ferroelectric CPW Phase Shifter for a Ku-Band APAA System
An Active Module Using a Ferroelectric CPW Phase Shifter for a Ku-Band APAA System
Han-cheol Ryu., | 한국물리학회 | 2006 ,
88
Barrier Property of a TiN Layer Prepared by Using Flow Modulation CVD for Cu Metallization
Barrier Property of a TiN Layer Prepared by Using Flow Modulation CVD for Cu Metallization
N. I. Cho., | 한국물리학회 | 2006 ,
89
Nonvolatile Memory Characteristics in Metal-Oxide-Semiconductors Containing Metal Nanoparticles Fabricated by Using a Unique Laser Irradiation Method
Nonvolatile Memory Characteristics in Metal-Oxide-Semiconductors Containing Metal Nanoparticles Fabricated by Using a Unique Laser Irradiation Method
Jungyup Yang., | 한국물리학회 | 2006 ,
90
Interface Analysis of an AlGaAs Multilayer System by Using Spectroscopic Ellipsometry
Interface Analysis of an AlGaAs Multilayer System by Using Spectroscopic Ellipsometry
T. H. Ghong., | 한국물리학회 | 2006 ,
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