본문

  1. Home
193 Results:AA:SE HWAN KIM 0.187 sec.
RSS 
Multilingual
 Расширенный поиск
 Новый поиск книги прибытия
Selected Print Select Export to Excel
81
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Chang Joon Park, | 한국전기전자재료학회 | 2005 ,
82
Electrical Properties and Temperature Effects of PET Films with Interface Layers
Electrical Properties and Temperature Effects of PET Films with Interface Layers
Dong Shick Kim, | 한국전기전자재료학회 | 2001 ,
83
Analysis of ITO on Polymer Substrate by External Bending Force
Analysis of ITO on Polymer Substrate by External Bending Force
Jin Woo Han, | 한국전기전자재료학회 | 2005 ,
84
Liquid Crystal Alignment on the SiC Thin Film by the Ion Beam Exposure Method
Liquid Crystal Alignment on the SiC Thin Film by the Ion Beam Exposure Method
Chang Joon Park, | 한국전기전자재료학회 | 2005 ,
85
Anti-inflammatory and radical scavenging properties of Verbena officinalis
Anti-inflammatory and radical scavenging properties of Verbena officinalis
Shim , Hwan-Ki, | Kyung Hee University Press | 2010 ,
86
Gray Mold of Day Lily (Hemerocallis fulva L.) Caused by Botrytis elliptica in Korea
Gray Mold of Day Lily (Hemerocallis fulva L.) Caused by Botrytis elliptica in Korea
Seog Won Chang, | 한국식물병리학회 | 2001 ,
87
기능성 MA 필름으로 포장한 이집트산 토마토의 신선도
기능성 MA 필름으로 포장한 이집트산 토마토의 신선도
박형우 ( Hyung Woo Park ), | 한국포장학회 | 2006 ,
88
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
Soo Yeon Jeong, | 한국전기전자재료학회 | 2007 ,
89
The Designing of an Air-gap Type FBAR Filter using Leach Equivalent Model
The Designing of an Air-gap Type FBAR Filter using Leach Equivalent Model
Hyung Wook Choi, | 한국전기전자재료학회 | 2007 ,
90
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Hwan Chul Kim, | 한국전기전자재료학회 | 2007 ,
처음이전12345678910이후마지막