본문

  1. Home
1000 Results:AA:YU C 0.343 sec.
RSS 
Multilingual
 Расширенный поиск
 Новый поиск книги прибытия
Selected Print Select Export to Excel
791
Production of Pigments and α-Tocopherol by Cell Cultures in Safflower (Carthamus tinctorius L.)
Production of Pigments and α-Tocopherol by Cell Cultures in Safflower (Carthamus tinctorius L.)
Wen Yuan Gao, | 한국식물학회 | 1999 ,
792
Two Ethylene Signaling Pathways in Senescing Carnation Petals : Exogenous Ethylene - induced Expression of Genes for 1-Aminocyclopropane-1-Carboxylate (ACC) Synthase and ACC Oxidase is Different from That of the Gene for Cysteine Prote
Two Ethylene Signaling Pathways in Senescing Carnation Petals : Exogenous Ethylene - induced Expression of Genes for 1-Aminocyclopropane-1-Carboxylate (ACC) Synthase and ACC Oxidase is Different from That of the Gene for Cysteine Prote
Shigeru Satoh, | 한국식물학회 | 2000 ,
793
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Chen, K. C. W, | American Accounting Assn | 2004 ,
794
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Chen, K. C. W., | American Accounting Assn | 2004 ,
795
Strategy for Application of Geospatial One-Stop (GOS) in Korea
Strategy for Application of Geospatial One-Stop (GOS) in Korea
Won Choi Kyung, | 한국GIS학회 | 2004 ,
796
Regular Paper : Physics of the Coefficient of Friction in CMP
Regular Paper : Physics of the Coefficient of Friction in CMP
Len Borucki, | 한국전기전자재료학회 | 2008 ,
797
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Soo Jin Lee, | 한국전기전자재료학회 | 2008 ,
798
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Hyo Sang Lee, | 한국전기전자재료학회 | 2008 ,
799
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Young Don Ko, | 한국전기전자재료학회 | 2008 ,
800
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Yun Zhuang, | 한국전기전자재료학회 | 2008 ,
처음이전75767778798081828384이후마지막