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71
Post-RTA Effect on the Electrical Characteristics of Nano-Scale Strained Si Grown on SiGe-on-Insulator n-MOSFET
Post-RTA Effect on the Electrical Characteristics of Nano-Scale Strained Si Grown on SiGe-on-Insulator n-MOSFET
Seong-Je Kim, | 한국물리학회 | 2007 ,
72
Electronic Band Structure and Photocatalytic Activity of M-Doped TiO(M=Co and Fe)
Electronic Band Structure and Photocatalytic Activity of M-Doped TiO(M=Co and Fe)
M. G. Ha, | 한국물리학회 | 2007 ,
73
Photophysical Properties and Electronic Structure of Highly Donor Doped(110) Layered Perovskite Material
Photophysical Properties and Electronic Structure of Highly Donor Doped(110) Layered Perovskite Material
E. D. Jeong, | 한국물리학회 | 2007 ,
74
Magnetic and Electric Properties of 0.3BiFeO₃-0.7PbTiO₃Thin Films Prepared by RF-Magnetron Sputtering
Magnetic and Electric Properties of 0.3BiFeO₃-0.7PbTiO₃Thin Films Prepared by RF-Magnetron Sputtering
Sun Hee Kang, | 한국물리학회 | 2007 ,
75
Enhanced Ferroelectric Properties of Mn-Doped BiFeO₃ Thin Films Prepared by Chemical Solution Deposition
Enhanced Ferroelectric Properties of Mn-Doped BiFeO₃ Thin Films Prepared by Chemical Solution Deposition
Jong Kuk Kim, | 한국물리학회 | 2007 ,
76
Quantum-Structure-Dependent Excitonic Carrier Dynamics of InχGa₁_χN/GaN Multi-Quantum-Wells
Quantum-Structure-Dependent Excitonic Carrier Dynamics of InχGa₁_χN/GaN Multi-Quantum-Wells
Sangsu Hong, | 한국물리학회 | 2007 ,
77
Crystalline Phase and Photoluminescence Characteristics for Li-Doped Gd₂O₃:Eu³+ Thin-film Phosphors Grown on Various Substrates
Crystalline Phase and Photoluminescence Characteristics for Li-Doped Gd₂O₃:Eu³+ Thin-film Phosphors Grown on Various Substrates
Jong Seong Bae, | 한국물리학회 | 2006 ,
78
Transparent Zinc-Indium-Oxide-Based Thin-Film Transistors Using an Organic Gate Dielectric Layer
Transparent Zinc-Indium-Oxide-Based Thin-Film Transistors Using an Organic Gate Dielectric Layer
Yong-Hoon Kim, | 한국물리학회 | 2006 ,
79
Characteristics of Al2O3 Thin Films Deposited Using Dimethyalluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al2O3 Thin Films Deposited Using Dimethyalluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Jaehyoung Koo, | 한국물리학회 | 2006 ,
80
Tribological Properties of Ultrathin DLC Films with and without Metal Interlayers
Tribological Properties of Ultrathin DLC Films with and without Metal Interlayers
Youngsook Jeon, | 한국물리학회 | 2007 ,
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