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71
전자세라믹 : 고용량 캐패시터로의 응용을 위한 ( Ba, Bi, Sr ) TiO3 세라믹스의 제조 및 특성에 관한 연구
전자세라믹 : 고용량 캐패시터로의 응용을 위한 ( Ba, Bi, Sr ) TiO3 세라믹스의 제조 및 특성에 관한 연구
이상철 ( Sang Chul Lee ), | 한국전기전자재료학회 | 2003 ,
72
초전도,자성체 ; Bi2Sr2Ca2.2Cu3Ox계에서 초전도상과 Bi-free상의 핵생성과 성장
초전도,자성체 ; Bi2Sr2Ca2.2Cu3Ox계에서 초전도상과 Bi-free상의 핵생성과 성장
오용택 ( Yong Taeg O ), | 한국전기전자재료학회 | 2003 ,
73
전자세라믹 ; Ar/O2비에 따른 (Ba,Sr)(Nb,Ti)O3[BSNT] 박막의 구조적 특성
전자세라믹 ; Ar/O2비에 따른 (Ba,Sr)(Nb,Ti)O3[BSNT] 박막의 구조적 특성
남성필 ( Sung Pill Nam ), | 한국전기전자재료학회 | 2003 ,
74
Critical Success Factors in Implementing and Managing Cyber Education Programs
Critical Success Factors in Implementing and Managing Cyber Education Programs
Yung Ho Suh, | 한국품질경영학회 | 2004 ,
75
Liquid Crystal Aligning Capabilities Treated on Organic Overcoat Thin Films by Ion Beam Irradiation Method
Liquid Crystal Aligning Capabilities Treated on Organic Overcoat Thin Films by Ion Beam Irradiation Method
Jeong Min Han, | 한국전기전자재료학회 | 2007 ,
76
Ethylene Biosynthesis in a Chilling-Sensitive Arabidopsis Mutant, chs4-2
Ethylene Biosynthesis in a Chilling-Sensitive Arabidopsis Mutant, chs4-2
Sun A Kim, | 한국식물학회(Adventitous Root Formation | 2004 ,
77
Comparative Expression and Characterization of Dehydroascorbate Reductase cDNA from Transformed Sesame Hairy Roots using Real-Time RT-PCR
Comparative Expression and Characterization of Dehydroascorbate Reductase cDNA from Transformed Sesame Hairy Roots using Real-Time RT-PCR
Jae An Chun, | 한국식물학회(Adventitous Root Formation | 2006 ,
78
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
79
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Chae Il Cheon, | 한국전기전자재료학회 | 2004 ,
80
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Hwan Chul Kim, | 한국전기전자재료학회 | 2007 ,
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