본문

  1. Home
1000 Results:AA:Y H YU 0.517 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
781
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Chen, K. C. W, | American Accounting Assn | 2004 ,
782
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Earnings Management and Capital Resource Allocation: Evidence from China's Accounting-Based Regulation of Rights Issues
Chen, K. C. W., | American Accounting Assn | 2004 ,
783
Strategy for Application of Geospatial One-Stop (GOS) in Korea
Strategy for Application of Geospatial One-Stop (GOS) in Korea
Won Choi Kyung, | 한국GIS학회 | 2004 ,
784
Regular Paper : Physics of the Coefficient of Friction in CMP
Regular Paper : Physics of the Coefficient of Friction in CMP
Len Borucki, | 한국전기전자재료학회 | 2008 ,
785
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Soo Jin Lee, | 한국전기전자재료학회 | 2008 ,
786
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Hyo Sang Lee, | 한국전기전자재료학회 | 2008 ,
787
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Young Don Ko, | 한국전기전자재료학회 | 2008 ,
788
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Yun Zhuang, | 한국전기전자재료학회 | 2008 ,
789
Regular Paper : Nature of Surface and Bulk Defects Induced by Epitaxial Growth in Epitaxial Layer Transfer Wafers
Regular Paper : Nature of Surface and Bulk Defects Induced by Epitaxial Growth in Epitaxial Layer Transfer Wafers
Suk Goo Kim, | 한국전기전자재료학회 | 2005 ,
790
Articles : Contribution of High-Technology Industry to Regional Economic Growth at Different Positions in the Distribution of a Region`S Size
Articles : Contribution of High-Technology Industry to Regional Economic Growth at Different Positions in the Distribution of a Region`S Size
Yu Jeung Ho, | 한국행정학회 | 2007 ,
처음이전74757677787980818283이후마지막