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731
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Chang Joon Park, | 한국전기전자재료학회 | 2005 ,
732
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
733
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
734
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
735
expression of Chromium (VI) Reductase Gene of Heavy Metal Reducing Bacteria in Tobacco Plants
expression of Chromium (VI) Reductase Gene of Heavy Metal Reducing Bacteria in Tobacco Plants
Tae-Eun Jin, | 한국식물학회 | 2001 ,
736
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Chae Il Cheon, | 한국전기전자재료학회 | 2004 ,
737
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
738
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Sang Keuk Lee, | 한국전기전자재료학회 | 2003 ,
739
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Bok Hee Youn, | 한국전기전자재료학회 | 2003 ,
740
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
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