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591
Anthracnose of Perilla Caused by Colletotrichum spp. and Glomerella cingulata
Anthracnose of Perilla Caused by Colletotrichum spp. and Glomerella cingulata
Wan Gyu Kim, | 한국식물병리학회 | 2001 ,
592
Occurrence of Apple scar skin viroid-Korean strain (ASSVd-K) in Apples Cultivated in Korea
Occurrence of Apple scar skin viroid-Korean strain (ASSVd-K) in Apples Cultivated in Korea
Ju Hee Lee, | 한국식물병리학회 | 2001 ,
593
Characteristics of Nano-crystalline TiO2 Dye-sensitized Solar Cells having Counter Electrodes with Different Preparing Process
Characteristics of Nano-crystalline TiO2 Dye-sensitized Solar Cells having Counter Electrodes with Different Preparing Process
Dong Yoon Lee, | 한국전기전자재료학회 | 2005 ,
594
Degradation of Ferroelectric Properties of Pt/PZT/Pt Capacitors in Hydrogen-containing Environment
Degradation of Ferroelectric Properties of Pt/PZT/Pt Capacitors in Hydrogen-containing Environment
Dong Chun Kim, | 한국전기전자재료학회 | 2005 ,
595
천연 색소인 안토시아니딘 기반의 인쇄형 시간-온도이력 지시계 개발
천연 색소인 안토시아니딘 기반의 인쇄형 시간-온도이력 지시계 개발
장한동 ( Han Dong Jang), | 한국포장학회 | 2006 ,
596
다양한 산소 투과도를 가진 커버필름과 산소지시물질로 제작된 인쇄형 TTI
다양한 산소 투과도를 가진 커버필름과 산소지시물질로 제작된 인쇄형 TTI
김도현 ( Do Hyeon Kim ), | 한국포장학회 | 2006 ,
597
A Comparison of Efficiency of Decolorizing Rhodamine Busing Lab-Scale Photocatalytic Reactors: Slurry Reactor, IWCR and PFBR
A Comparison of Efficiency of Decolorizing Rhodamine Busing Lab-Scale Photocatalytic Reactors: Slurry Reactor, IWCR and PFBR
Young Soo Na, | The Korean Environmental Sciences Societ | 2001 ,
598
Comparison of Latin Hypercube Sampling and Simple Random Sampling Applied to Neural Network Modeling of HfO2 Thin Film Fabrication
Comparison of Latin Hypercube Sampling and Simple Random Sampling Applied to Neural Network Modeling of HfO2 Thin Film Fabrication
Jung Hwan Lee, | 한국전기전자재료학회 | 2007 ,
599
Demonstration of Alternative Fabrication Techniques for Robust MEMS Device
Demonstration of Alternative Fabrication Techniques for Robust MEMS Device
Sung Pil Chang, | 한국전기전자재료학회 | 2007 ,
600
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Effect of Particle Size of Ceria Coated Silica and Polishing Pressure on Chemical Mechanical Polishing of Oxide Film
Hwan Chul Kim, | 한국전기전자재료학회 | 2007 ,
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