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51
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
Sungmin Hwang., | 한국물리학회 | 2006 ,
52
Electrical Characterization of Planar Buried Heterostructure SGDBR Wavelength-Tunable Laser Diodes Using the Current Derivative Method
Electrical Characterization of Planar Buried Heterostructure SGDBR Wavelength-Tunable Laser Diodes Using the Current Derivative Method
Ji-myon Lee., | 한국물리학회 | 2006 ,
53
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
54
Customized Correction of Wavefront Aberrations in Abnormal Human Eyes by Using a Phase Plate and a Customized Contact lens
Customized Correction of Wavefront Aberrations in Abnormal Human Eyes by Using a Phase Plate and a Customized Contact lens
Tae Moon Jeong., | 한국물리학회 | 2006 ,
55
A Classification of Plane Symmetric Kinematic Self-Similar Solutions
A Classification of Plane Symmetric Kinematic Self-Similar Solutions
M. Sharif., | 한국물리학회 | 2006 ,
56
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
57
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
58
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
59
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Ku-hyun Lee., | 한국물리학회 | 2006 ,
60
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
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