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471
Design and Analysis of Linear Channel-Selection Filter for Direct Conversion Receiver
Design and Analysis of Linear Channel-Selection Filter for Direct Conversion Receiver
Sangsu Jin, | 대한전자공학회 | 2004 ,
472
Characteristics of Surface Micromachined Pyroelectric Infrared Ray Focal Plane Array
Characteristics of Surface Micromachined Pyroelectric Infrared Ray Focal Plane Array
Sang-Ouk Ryu, | 대한전자공학회 | 2005 ,
473
4H-SiC Planar MESFET for Microwave Power Device Applications
4H-SiC Planar MESFET for Microwave Power Device Applications
Hoon Joo Na, | 대한전자공학회 | 2005 ,
474
V-band Self-heterodyne Wireless Transceiver using MMIC Modules
V-band Self-heterodyne Wireless Transceiver using MMIC Modules
Dan An, Mun-Kyo Lee, Sang-Jin Lee, Du-Hyun Ko, Ji, | 대한전자공학회 | 2005 ,
475
Device Characterization and Fabrication issues for Ferroelectric Gate Field Effect Transistor Device
Device Characterization and Fabrication issues for Ferroelectric Gate Field Effect Transistor Device
Byoung-Gon Yu, | 대한전자공학회 | 2002 ,
476
Metal-Organic Chemical Vapor Deposition of Pb(ZrxTi1-x)O3 Thin Films for High-Density Ferroelectric Random Access Memory Application
Metal-Organic Chemical Vapor Deposition of Pb(ZrxTi1-x)O3 Thin Films for High-Density Ferroelectric Random Access Memory Application
June Key Lee, | 대한전자공학회 | 2002 ,
477
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
Youngjoon Ahn, | 대한전자공학회 | 2002 ,
478
High Conversion Gain Q-band Active Sub-harmonic Mixer Using GaAs PHEMT
High Conversion Gain Q-band Active Sub-harmonic Mixer Using GaAs PHEMT
Won-Young Uhm, | 대한전자공학회 | 2003 ,
479
Comparison of Retention Characteristics of Ferroelectric Capacitors with Pb(Zr,Ti)O3 Films Deposited by various Methods for High-density Non-volatile Memory
Comparison of Retention Characteristics of Ferroelectric Capacitors with Pb(Zr,Ti)O3 Films Deposited by various Methods for High-density Non-volatile Memory
Sangmin Shin, | 대한전자공학회 | 2003 ,
480
Flowable Oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor
Flowable Oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor
Sung-Woong Chung, | 대한전자공학회 | 2004 ,
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