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21
A Polycrystalline CdZnTe Film and Its X-ray Response Characteristics for Digital Radiography
A Polycrystalline CdZnTe Film and Its X-ray Response Characteristics for Digital Radiography
Jae Hyung Kim, | 한국전기전자재료학회 | 2004 ,
22
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
23
나노기술 적용을 통한 포장 분야의 전망
나노기술 적용을 통한 포장 분야의 전망
김재능 ( Jai Neung Kim ), | 한국포장학회 | 2006 ,
24
영양소 섭취의 주요급원식품과 주요변이식품들을 이용한 간소화된 반정량 빈도 조사 도구의 개발 및 평가
영양소 섭취의 주요급원식품과 주요변이식품들을 이용한 간소화된 반정량 빈도 조사 도구의 개발 및 평가
김미양(Mi Yang Kim), | 한국영양학회 | 2002 ,
25
AN ANALYSIS OF GAME AAN RADIATION DATA SETS
AN ANALYSIS OF GAME AAN RADIATION DATA SETS
Do-Hyeong Kim, | 한국기상학회 | 2001 ,
26
Solution-phase Synthesis and Preliminary Evaluation of 1,6,8-Trisubstituted Tetrahydro-2H-pyraziono[1,2-a]pyrimidin-4,7- dione Derivatives as a NF-kB Inhibitor
Solution-phase Synthesis and Preliminary Evaluation of 1,6,8-Trisubstituted Tetrahydro-2H-pyraziono[1,2-a]pyrimidin-4,7- dione Derivatives as a NF-kB Inhibitor
Jin-Woong Kim, | 대한화학회 | 2006 ,
27
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
Chang Young Kim, | 한국물리학회 | 2007 ,
28
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
29
UV-Ozone Surface Treatment of Indium-Tin-Oxide In Organic Light Emitting Diodes
UV-Ozone Surface Treatment of Indium-Tin-Oxide In Organic Light Emitting Diodes
Byoung-Sang Kim, | 한국물리학회 | 2007 ,
30
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Seung Hyung Kim, | 한국물리학회 | 2007 ,
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