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11
the computerized process-oriented writing assessment and its autheniticity
the computerized process-oriented writing assessment and its autheniticity
이영주, | 한국외국어교육학회 | 2006 ,
12
Efficiency Estimation of process plan using tolerance chart
Efficiency Estimation of process plan using tolerance chart
Kim I.H, | 한국 CAD/CAM학회 | 2006 ,
13
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Gon-ho Kim., | 한국물리학회 | 2006 ,
14
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
Sungmin Hwang., | 한국물리학회 | 2006 ,
15
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Byungsik Hong., | 한국물리학회 | 2006 ,
16
Self-Organized Process for Patterning of a Thin-Film Transistor
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-kwon Choo., | 한국물리학회 | 2006 ,
17
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
18
Novel Model for Film Formation in Plasma Processing
Novel Model for Film Formation in Plasma Processing
Leonid R. Shaginyan., | 한국물리학회 | 2006 ,
19
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Sang-kon Kim., | 한국물리학회 | 2006 ,
20
Understanding the Behaviors of Cu During a Post-Gate-Oxidation Device Process by Using an Isotope Tracking Analysis
Understanding the Behaviors of Cu During a Post-Gate-Oxidation Device Process by Using an Isotope Tracking Analysis
Sung-wook Lee., | 한국물리학회 | 2006 ,
처음이전12345678910이후마지막
1
Advanced Material and Processing
대한금속재료학회(구 대한금속학회) [기계공학, ]
2
Advanced Materials & Processes
ASM International [, ]
3
Applied Physics A: Materials Science & Processing
Springer - Verlag New York, Inc. [, ]
4
Bioprocess
Hans Publishing [, ]
5
European Journal of Mineral Processing & Environmental Protection
European Journal of Mineral Processing & Environmental Protection [, ]
6
Family Process
Family Process [, ]
7
Family Process
Family Process [, ]
8
Hydrocarbon Processing
Gulf Publishing [, ]
9
ICONIP : International Conference On Neural Information Processing
대한전자공학회 [, ]
10
ICONIP : International Conference On Neural Information Processing
대한전자공학회 [공학, ]
11
IEE Proceedings -- Vision, Image & Signal Processing
IEE [, ]
12
IEIE Transactions on Smart Processing & Computing
대한전자공학회 [, ]
13
IEIE Transactions on Smart Processing & Computing
대한전자공학회 [공학, ]
14
IET Image Processing
Institution of Engineering & Technology [, ]
15
International Journal of Computer Processing of Languages
World Scientific Publishing Company [, ]
16
International Journal of Computer Processing of Oriental Languages
World Scientific Publishing Company [, ]
17
International Journal of Wavelets, Multiresolution & Information Processing
World Scientific Publishing Company [, ]
18
Journal of information processing systems
한국정보처리학회 [전기공학·전자공학, ]
19
Journal of Integrated Design & Process Science
IOS Press [, ]
20
Mineral Processing & Extractive Metallurgy Review
Taylor & Francis Ltd [, ]