본문

  1. Home
12 Results:AA:KO DH 0.93 sec.
RSS 
Multilingual
 Búsqueda Avanzada
 Nueva llegada Buscar
Selected Print Select Export to Excel
11
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Chung, K. B., | 한국물리학회 | 2006 ,
12
Post-Peak Behavior and Flexural Ductility of Doubly Reinforced Normal- and High-Strength Concrete Beams
Post-Peak Behavior and Flexural Ductility of Doubly Reinforced Normal- and High-Strength Concrete Beams
H.J. Pam, A.K.H. Kwan and J.C.M. Ho (Hong Kong), | 국제구조공학회 | 2001 ,
처음이전12마지막