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181
Photo-Neutrons Produced at the Pohang Neutron Facility Based on an Electron Linac
Photo-Neutrons Produced at the Pohang Neutron Facility Based on an Electron Linac
K. Devan., | 한국물리학회 | 2006 ,
182
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Byungsik Hong., | 한국물리학회 | 2006 ,
183
Self-Organized Process for Patterning of a Thin-Film Transistor
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-kwon Choo., | 한국물리학회 | 2006 ,
184
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
185
Effects of Hydrogen Annealing on the Thermoelectric Properties of Electrodeposited Bi₂Te₃ for Nanowire Applications
Effects of Hydrogen Annealing on the Thermoelectric Properties of Electrodeposited Bi₂Te₃ for Nanowire Applications
Sung-woo Jun., | 한국물리학회 | 2006 ,
186
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
187
Novel Model for Film Formation in Plasma Processing
Novel Model for Film Formation in Plasma Processing
Leonid R. Shaginyan., | 한국물리학회 | 2006 ,
188
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Wonjoon Choi., | 한국물리학회 | 2006 ,
189
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Sang-kon Kim., | 한국물리학회 | 2006 ,
190
Immobilization and Observation of Particles with 3-Aminopropyltrimethoxysilane Studied by Scanning Probe Microscopy
Immobilization and Observation of Particles with 3-Aminopropyltrimethoxysilane Studied by Scanning Probe Microscopy
Y. J. Oh., | 한국물리학회 | 2006 ,
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ASM International [, ]
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