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141
Fabrication and Properties of an Epitaxial AIN Film on a SiC Substrate by Using Reactive RF Magnetron Sputtering
Fabrication and Properties of an Epitaxial AIN Film on a SiC Substrate by Using Reactive RF Magnetron Sputtering
Kim, Kwang-ho, | 한국물리학회 | 2006 ,
142
Thin-Film Transistors Based on ZnO Fabricated by Using Radio-Frequency Magnetron Sputtering
Thin-Film Transistors Based on ZnO Fabricated by Using Radio-Frequency Magnetron Sputtering
Navamathavan, R., | 한국물리학회 | 2006 ,
143
Growth of Cubic GaN on a Nitrided AlGaAs(001) Substrate by Using Hydried Vapor Phase Epitaxy
Growth of Cubic GaN on a Nitrided AlGaAs(001) Substrate by Using Hydried Vapor Phase Epitaxy
Lee, H. J., | 한국물리학회 | 2006 ,
144
Characteristics of a Large-Area Plasma Source Using Internal Multiple U-Type Antenna
Characteristics of a Large-Area Plasma Source Using Internal Multiple U-Type Antenna
Kim, Kyong Nam, | 한국물리학회 | 2006 ,
145
Spatial Light Modulator Using Poly(Vinylidenefluoride-Trifluoroethylene-Chlorofluoroethylene) Terpolymer with a High Electrostrictive Strain
Spatial Light Modulator Using Poly(Vinylidenefluoride-Trifluoroethylene-Chlorofluoroethylene) Terpolymer with a High Electrostrictive Strain
Jeong, Dae-yong, | 한국물리학회 | 2006 ,
146
Electro-Optical Analysis of Super IPS-LCDs by Using a Three-Dimensional Molecular Director Simulation
Electro-Optical Analysis of Super IPS-LCDs by Using a Three-Dimensional Molecular Director Simulation
Jung, Sung-min, | 한국물리학회 | 2006 ,
147
Investigation of Pit Formation in Laser-Irradiated Multilayer Thin Films by Using Optical Coherence Tomography
Investigation of Pit Formation in Laser-Irradiated Multilayer Thin Films by Using Optical Coherence Tomography
Shin, Yongjin, | 한국물리학회 | 2006 ,
148
The Effect of the Partial Pressure of H₂ Gas and Atomic Hydrogen on Diamond Films Deposited Using CH₃OH/H₂O Gas
The Effect of the Partial Pressure of H₂ Gas and Atomic Hydrogen on Diamond Films Deposited Using CH₃OH/H₂O Gas
Lee, Kwon-jai, | 한국물리학회 | 2006 ,
149
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Koo, Jaehyoung, | 한국물리학회 | 2006 ,
150
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Lee, June Hee, | 한국물리학회 | 2006 ,
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