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91
TFA-MOD 방법에 의한 YBCO박막제조에서 nano size Y₂O₃첨가효과
TFA-MOD 방법에 의한 YBCO박막제조에서 nano size Y₂O₃첨가효과
박진아, | 한국초전도 저온공학회 | 2006 ,
92
SIFT기법을 이용한 중.저해상도 위성영상간의 자동 기하보정
SIFT기법을 이용한 중.저해상도 위성영상간의 자동 기하보정
한동엽, | 한국측량학회 | 2006 ,
93
Photon Mass Energy Absorption Coefficients from 0.4 MeV to 10 MeV for Silicon, Carbon, Copper and Sodium Iodide
Photon Mass Energy Absorption Coefficients from 0.4 MeV to 10 MeV for Silicon, Carbon, Copper and Sodium Iodide
H. Oz., | 한국물리학회 | 2006 ,
94
Effects of Oxolonic acid on microbial community under simulated marinefish farm environment
Effects of Oxolonic acid on microbial community under simulated marinefish farm environment
Yoon Duk Hyun, | 해양환경안전학회 | 2006 ,
95
자료포괄분석과 생산성지수분석을 이용한 국내 SI기업의 효율성 분석
자료포괄분석과 생산성지수분석을 이용한 국내 SI기업의 효율성 분석
김건식, | 한국SI학회(한국IT서비스학회) | 2006 ,
96
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
97
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
98
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
99
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
100
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Rangaswamy Navamathavan., | 한국물리학회 | 2006 ,
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