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1
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
S. G. Yoon., | 한국물리학회 | 2006 ,
2
Barrier Property of a TiN Layer Prepared by Using Flow Modulation CVD for Cu Metallization
Barrier Property of a TiN Layer Prepared by Using Flow Modulation CVD for Cu Metallization
N. I. Cho., | 한국물리학회 | 2006 ,
3
Coercivity of the Co-Precipitated Prepared Haxaferrites, BaFe12-2x CoxSnxO19
Coercivity of the Co-Precipitated Prepared Haxaferrites, BaFe12-2x CoxSnxO19
Siriphan Nilpairach., | 한국물리학회 | 2006 ,
4
AZO films prepared by facing target sputtering systems
AZO films prepared by facing target sputtering systems
Kim, Kyung-Hwan, | 한국전기전자재료학회 | 2007 ,
5
Metal Injection Molding of W-Cu Powders Prepared by Low Energy Ball Milling
Metal Injection Molding of W-Cu Powders Prepared by Low Energy Ball Milling
Soon-Wook Kim, Kyung-Jin Suk, Young-Do Kim, | Korean Institute of Metals and Materials | 2006 ,
6
Characteristics of Gas Permeation using Two-layered Alumina Membrane Prepared by Anodic Oxidation
Characteristics of Gas Permeation using Two-layered Alumina Membrane Prepared by Anodic Oxidation
Chang-Woo Lee, Chang-Il Lee, Won Shim, Yoon-Ho Ch, | 한국화학공학회 | 2001 ,
7
Characterization of Iron(Ⅲ) Oxide Nanoparticles Prepared by Using Ammonium Acetate as Precipitating Agent
Characterization of Iron(Ⅲ) Oxide Nanoparticles Prepared by Using Ammonium Acetate as Precipitating Agent
Ji Young Park, Seong Geun Oh, Baik Hyon Ha, | 한국화학공학회 | 2001 ,
8
Gas Permeation Characteristics of Silica/Alumina Composite Membrane Prepared by Chemical Vapor Deposition
Gas Permeation Characteristics of Silica/Alumina Composite Membrane Prepared by Chemical Vapor Deposition
Sung Soo Kim, Bong-Kuk Sea, | 한국화학공학회 | 2001 ,
9
Electrochemical Synthesis of Ba-and Sr-Based Titanate Thin Films using Ti Electrode Prepared by RF Sputtering
Electrochemical Synthesis of Ba-and Sr-Based Titanate Thin Films using Ti Electrode Prepared by RF Sputtering
Jae Hong Kim, Jinwook Kang, Geon-Joong Kim, Yongs, | 한국화학공학회 | 2001 ,
10
Thermotreatment and Chemical Resistance of Porous Alumina Membrane Prepared by Anodic Oxidation
Thermotreatment and Chemical Resistance of Porous Alumina Membrane Prepared by Anodic Oxidation
Chang Woo Lee, Hyun-Seop Kang, Yoon-Ho Chang, Yeo, | 한국화학공학회 | 2000 ,
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