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1
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
2
Modified Korteweg-de Vries Theory of Monotonic Double Jayers in Plasmas with Negative Ions
Modified Korteweg-de Vries Theory of Monotonic Double Jayers in Plasmas with Negative Ions
Kim, Tae-han, | 한국물리학회 | 2006 ,
3
Negative Ion Etching of Al-Si-Cu by Employing a Magnetic Filter in Halogen Plasmas
Negative Ion Etching of Al-Si-Cu by Employing a Magnetic Filter in Halogen Plasmas
Bong-Ju Lee,Yasuhiro Horiike, | 대한금속.재료학회 | 2002 ,
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1
Physics of Plasmas
American Institute of Physics [, ]
2
Plasmas & Polymers
Kluwer Academic Publishing / Academic [, ]