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1
Efficiency of an SCM415 Alloy Surface Layer Implanted with Nitrogen lons by Plasma Source Ion Implantation
Efficiency of an SCM415 Alloy Surface Layer Implanted with Nitrogen lons by Plasma Source Ion Implantation
Sung-Ki Lyu., | 한국정밀공학회 | 2006 ,
2
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot
Kazunori Ichikawa., | 한국물리학회 | 2006 ,
3
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
4
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
5
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
6
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
7
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Ku-hyun Lee., | 한국물리학회 | 2006 ,
8
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
9
Novel Model for Film Formation in Plasma Processing
Novel Model for Film Formation in Plasma Processing
Leonid R. Shaginyan., | 한국물리학회 | 2006 ,
10
Effect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization
Effect of Plasma Treatment on the Performance of a Thin-Film Transistor Made of Poly-Si by Using Ni-Mediated Crystallization
Sang Kyu Kim., | 한국물리학회 | 2006 ,
처음123456이후마지막
1
Physics of Fluids B: Plasma Physics
American Institute of Physics [, ]
2
Physics of Plasmas
American Institute of Physics [, ]
3
Plasma Devices & Operations
Taylor & Francis Ltd [, ]
4
Plasma Physics Reports
MAIK Nauka Interperiodica [, ]
5
Plasmas & Polymers
Kluwer Academic Publishing / Academic [, ]
6
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena
Taylor & Francis Ltd [, ]