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1
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
2
Photochromic Mechanism in a-WO₃ Thin Films Based on Raman Spectroscopic Studies
Photochromic Mechanism in a-WO₃ Thin Films Based on Raman Spectroscopic Studies
Kyungmoon Kim., | 한국물리학회 | 2006 ,
3
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Chung, K. B., | 한국물리학회 | 2006 ,
4
Holographic Grating Erasing Characteristics by Non-poarized Beam in Amorphous Chalcogenide Thin Films
Holographic Grating Erasing Characteristics by Non-poarized Beam in Amorphous Chalcogenide Thin Films
Ki-Nam Lee, | 한국전기전자재료학회 | 2006 ,
5
Assessment and Applications of Multi-Degradable Polyethylene Films as Packaging Materials
Assessment and Applications of Multi-Degradable Polyethylene Films as Packaging Materials
Myong-Soo Chung, Sang-Hyun Lee, Young-Sun You, Hy, | Korean Societyof Food Science&Technology | 2006 ,
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