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1
Isolation of Antimicrobial Substances from Natural Products and Their Preservative Effect
Isolation of Antimicrobial Substances from Natural Products and Their Preservative Effect
Hee-Yun Kim, | 한국식품과학회 | 2001 ,
2
Regional Differences of Four Major Rice Cultivars in Korea by Capillary Electrophoresis
Regional Differences of Four Major Rice Cultivars in Korea by Capillary Electrophoresis
Mee-Ra Rhyu, | 한국식품과학회 | 2001 ,
3
Probabilistic solution to stochastic infiltrated flow equation
Probabilistic solution to stochastic infiltrated flow equation
Sangdan Kim,, | 대한토목학회 | 2004 ,
4
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Tae Gun Kim, | 한국전기전자재료학회 | 2005 ,
5
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
6
Experiment of Drifting Mobilities of Holes and Electrons in Stabilized a-Se Film
Experiment of Drifting Mobilities of Holes and Electrons in Stabilized a-Se Film
Sang Sik Kang, | 한국전기전자재료학회 | 2004 ,
7
Study on Electrical Properties of X-ray Sensor Based on CsI:Na-Selenium Film
Study on Electrical Properties of X-ray Sensor Based on CsI:Na-Selenium Film
Ji Koon Park, | 한국전기전자재료학회 | 2004 ,
8
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
9
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
10
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
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