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1
Regional Differences of Four Major Rice Cultivars in Korea by Capillary Electrophoresis
Regional Differences of Four Major Rice Cultivars in Korea by Capillary Electrophoresis
Mee-Ra Rhyu, | 한국식품과학회 | 2001 ,
2
Can a Representative-Agent Model Represent a Heterogeneous-Agent Economy
Can a Representative-Agent Model Represent a Heterogeneous-Agent Economy
Sungbae An,, | american economic association | 2009 ,
3
Worker Heterogeneity and Endogenous Separations in a Matching Model of Unemployment Fluctuations
Worker Heterogeneity and Endogenous Separations in a Matching Model of Unemployment Fluctuations
Mark Bils,, | american economic association | 2011 ,
4
Interpreting Labor Supply Regressions in a Model of Full- and Part-Time Work
Interpreting Labor Supply Regressions in a Model of Full- and Part-Time Work
Yongsung Chang, | American Economic Assn | 2011 ,
5
Patterns of Allozyme Variation in Relation to Population Size of the Threatened Plant Megaleranthis saniculifolia (Ranunculaceae) in Korea
Patterns of Allozyme Variation in Relation to Population Size of the Threatened Plant Megaleranthis saniculifolia (Ranunculaceae) in Korea
Chin Sung Chang, | 한국식물학회(Adventitous Root Formation | 2005 ,
6
Optimization of Direct Somatic Embryogenesis from Mature Zygotic Embryos of Panax ginseng C. A. Meyer
Optimization of Direct Somatic Embryogenesis from Mature Zygotic Embryos of Panax ginseng C. A. Meyer
Ok Tae Kim, | 한국식물학회(Adventitous Root Formation | 2006 ,
7
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Tae Gun Kim, | 한국전기전자재료학회 | 2005 ,
8
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
9
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
10
Stability of H2O2 as an Oxidizer for Cu CMP
Stability of H2O2 as an Oxidizer for Cu CMP
Do Won Lee, | 한국전기전자재료학회 | 2005 ,
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