본문

  1. Home
21 Results:AA:CHANG HOON KIM 0.172 sec.
RSS 
Multilingual
 Расширенный поиск
 Новый поиск книги прибытия
Selected Print Select Export to Excel
1
Expression of Tobacco cDNA Encoding Phytochelatin Synthase Promotes Tolerance to and Accumulation of Cd and As in Saccharomyces cerevisiae
Expression of Tobacco cDNA Encoding Phytochelatin Synthase Promotes Tolerance to and Accumulation of Cd and As in Saccharomyces cerevisiae
Young Jin Kim, | 한국식물학회(Adventitous Root Formation | 2005 ,
2
Monitoring the Occurrence of Genetically Modified Soybean and Maize around Cultivated Fields and at a Grain Receiving Port in Korea
Monitoring the Occurrence of Genetically Modified Soybean and Maize around Cultivated Fields and at a Grain Receiving Port in Korea
Chang Gi Kim, | 한국식물학회(Adventitous Root Formation | 2006 ,
3
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry
Tae Gun Kim, | 한국전기전자재료학회 | 2005 ,
4
Circuit Modeling of 3-D Parallel-plate Capacitors Fabricated by LTCC Process
Circuit Modeling of 3-D Parallel-plate Capacitors Fabricated by LTCC Process
Dong Wook Shin, | 한국전기전자재료학회 | 2005 ,
5
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
6
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Roles of Phosphoric Acid in Slurry for Cu and TaN CMP
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
7
Investigations on the Etching of Platinum Film using High Density Inductively Coupled Ar/Cl2/HBr Plasmas
Investigations on the Etching of Platinum Film using High Density Inductively Coupled Ar/Cl2/HBr Plasmas
Nam Hoon Kim, | 한국전기전자재료학회 | 2001 ,
8
Regular Paper / A Study on Pumping Effect of Oxygen in Polysilicon Gate Etching
Regular Paper / A Study on Pumping Effect of Oxygen in Polysilicon Gate Etching
Nam Hoon Kim, | 한국전기전자재료학회 | 2001 ,
9
Stability of H2O2 as an Oxidizer for Cu CMP
Stability of H2O2 as an Oxidizer for Cu CMP
Do Won Lee, | 한국전기전자재료학회 | 2005 ,
10
A Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process
A Study on the Optimized Copper Electrochemical Plating in Dual Damascene Process
Hae Young Yoo, | 한국전기전자재료학회 | 2005 ,
처음123이후마지막