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1
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Lee, June Hee, | 한국물리학회 | 2006 ,
처음1마지막
1
BT NEWS
한국생물공학회 [, ]
2
BT NEWS
한국생물공학회 [공학, ]
3
HPB: The Official Journal of the International Hepato Pacreato Biliary Association
Martin Dunitz Publishers [, ]
4
Johnson's Recommendation for the Revaluation of Public Debt
Great Neck Publishing [, ]