본문

  1. Home
21 Results:AA:SOHN D 0.93 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
1
Investigation of Resonant Wavelength Separation in Microband-induced Fiber Gratings
Investigation of Resonant Wavelength Separation in Microband-induced Fiber Gratings
Kyung Rak Sohn, | 한국광학회 | 2006 ,
2
NiO/La2O3-ZrO2/WO3 Catalyst Prepared by Doping ZrO2 with La2O3 and Modifying with WO3 for Acid Catalysis
NiO/La2O3-ZrO2/WO3 Catalyst Prepared by Doping ZrO2 with La2O3 and Modifying with WO3 for Acid Catalysis
Jong Rack Sohn, | 대한화학회 | 2006 ,
3
Effect of Dispersed MoO3 Amount on Catalytic Activity of NiO-ZrO2 Modified with MoO3 for Acid Catalysis
Effect of Dispersed MoO3 Amount on Catalytic Activity of NiO-ZrO2 Modified with MoO3 for Acid Catalysis
Sohn, Jong-Rack, | 대한화학회 | 2006 ,
4
CeO2-Promoted Highly Active Catalyst, NiSO4/CeO2-ZrO2 for Ethylene Dimerization
CeO2-Promoted Highly Active Catalyst, NiSO4/CeO2-ZrO2 for Ethylene Dimerization
Young Il Pae, | 대한화학회 | 2006 ,
5
Aggregation-Induced Emission Enhancement of Polysilole Nanoaggregates
Aggregation-Induced Emission Enhancement of Polysilole Nanoaggregates
Seunghyun Jang, | 대한화학회 | 2006 ,
6
Improvement of Column Spzcer Uniformity in a TFT LCD Panel
Improvement of Column Spzcer Uniformity in a TFT LCD Panel
Jung-Hyuk Cho, | 한국물리학회 | 2006 ,
7
Fault Detection in the Two-for-One Twister
Fault Detection in the Two-for-One Twister
Ho Cheol Park, | 제어자동화시스템공학회 | 2006 ,
8
A New Landsat Image Co-Registration and Outlier Removal Techniques
A New Landsat Image Co-Registration and Outlier Removal Techniques
Jong-Hong Kim, | 대한원격탐사학회 | 2006 ,
9
Comparison of Two Acidic Leaching Processes for Selecting the Effective Recycle Process of Spent Lithium ion Battery
Comparison of Two Acidic Leaching Processes for Selecting the Effective Recycle Process of Spent Lithium ion Battery
Jeong-Soo Sohn., | 한구지구시스템공학회=한국자원공학회 | 2006 ,
10
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
처음123이후마지막