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Behavior of Amorphous Materials under Hydrostatic Pressures : A Molecular Dynamics Simulation Study
Behavior of Amorphous Materials under Hydrostatic Pressures : A Molecular Dynamics Simulation Study
Byeong-Joo Lee, Jae Chul Lee, Yu-Chan Kim, | 대한금속.재료학회 | 2004 ,
2
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
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