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Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-, | 한국화학공학회 | 2001 ,
2
Ion Separation of Binary Metallic Aqueous Solutions at Acidic Langmuir Monolayer Surfaces
Ion Separation of Binary Metallic Aqueous Solutions at Acidic Langmuir Monolayer Surfaces
Tai Young Kim, Gil Sun Lee, Dong June Ahn, | 한국화학공학회 | 2001 ,
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