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1
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-, | 한국화학공학회 | 2001 ,
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Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Kwang-sik Kim,Hyoun-woo Kim, | 대한금속.재료학회 | 2001 ,
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1
Semiconductor Wafor Cleaning and Surface Characterization
대한금속재료학회(구 대한금속학회) [기계공학, ]