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81
Production of Bi₂O₃ Nanorods via a Catalyst-Free Approach
Production of Bi₂O₃ Nanorods via a Catalyst-Free Approach
Hyoun Woo Kim., | 한국물리학회 | 2006 ,
82
Crystallographic and Magnetic Properties of Zn-Mn Ferrite
Crystallographic and Magnetic Properties of Zn-Mn Ferrite
Jae-gwang Lee., | 한국물리학회 | 2006 ,
83
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Fucheng Yu., | 한국물리학회 | 2006 ,
84
Guided Mode Propagations of Grounded Double-Positive and Double-Negative Metamaterial Slabs with Arbitrary Material Indexes
Guided Mode Propagations of Grounded Double-Positive and Double-Negative Metamaterial Slabs with Arbitrary Material Indexes
Ki Young Kim., | 한국물리학회 | 2006 ,
85
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Gon-ho Kim., | 한국물리학회 | 2006 ,
86
Terahertz Dielectric Properties of Polymers
Terahertz Dielectric Properties of Polymers
Yun-sik Jin., | 한국물리학회 | 2006 ,
87
The Evaporation of a Droplet Produced from a Liquid Surface
The Evaporation of a Droplet Produced from a Liquid Surface
Heetae Kim., | 한국물리학회 | 2006 ,
88
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
Sungmin Hwang., | 한국물리학회 | 2006 ,
89
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
S. G. Yoon., | 한국물리학회 | 2006 ,
90
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
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