본문

  1. Home
1000 Results:AA:H G LEE 0.434 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
811
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Tae Seok Sim, | 대한전자공학회 | 2005 ,
812
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Tae Seok Sim, | 대한전자공학회 | 2002 ,
813
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
Youngjoon Ahn, | 대한전자공학회 | 2002 ,
814
Fabrication Uncertainty and Noise Issues in high-Precision MEMS Actuators and Sensors
Fabrication Uncertainty and Noise Issues in high-Precision MEMS Actuators and Sensors
Young-Ho Cho, | 대한전자공학회 | 2002 ,
815
Fabrication of 3D Microstructures with Single uv Lithography Step
Fabrication of 3D Microstructures with Single uv Lithography Step
Man Hee Han, | 대한전자공학회 | 2002 ,
816
Piezoelectric PZT Cantilever Array Integrated with Piezoresistor for High Speed Operation and Calibration of Atomic Force Microscopy
Piezoelectric PZT Cantilever Array Integrated with Piezoresistor for High Speed Operation and Calibration of Atomic Force Microscopy
Young-Sik Kim, | 대한전자공학회 | 2002 ,
817
Investigation of Oxygen Incorporation in A1GaN/GaN Heterostructures
Investigation of Oxygen Incorporation in A1GaN/GaN Heterostructures
Ho Won Jang, | 대한전자공학회 | 2003 ,
818
Comparison of Retention Characteristics of Ferroelectric Capacitors with Pb(Zr,Ti)O3 Films Deposited by various Methods for High-density Non-volatile Memory
Comparison of Retention Characteristics of Ferroelectric Capacitors with Pb(Zr,Ti)O3 Films Deposited by various Methods for High-density Non-volatile Memory
Sangmin Shin, | 대한전자공학회 | 2003 ,
819
Flowable Oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor
Flowable Oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor
Sung-Woong Chung, | 대한전자공학회 | 2004 ,
820
Design Consideration of Body-Tied FinFETs(\{Omega}MOSFETs) Implemented on Bulk Si Wafers
Design Consideration of Body-Tied FinFETs(\{Omega}MOSFETs) Implemented on Bulk Si Wafers
Kyoung-Rok Han, | 대한전자공학회 | 2004 ,
처음이전77787980818283848586이후마지막