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761
Parametric Study on Edge Localized Modes with a Coupled Peeling-Ballooning Triggering Model for the KSTAR Tokamak
Parametric Study on Edge Localized Modes with a Coupled Peeling-Ballooning Triggering Model for the KSTAR Tokamak
Ki Min Kim, | 한국물리학회 | 2006 ,
762
Standardization : fundamentals, impact, and business strategy
Standardization : fundamentals, impact, and business strategy
APEC, 370-A639s-R | APEC | 2010 370-A639s-R,
763
Stability of the m/n=1/1 Mode during the Ramp Phase of the Sawtooth Oscillations at Different Phase Angles of the Lower Hybrid Wave on the HT-7 Tokamak
Stability of the m/n=1/1 Mode during the Ramp Phase of the Sawtooth Oscillations at Different Phase Angles of the Lower Hybrid Wave on the HT-7 Tokamak
Youwen Sun, | 한국물리학회 | 2006 ,
764
Analysis of Energy Loss Rates of High-Density Electron Hole Plasma in GaN and ZnO
Analysis of Energy Loss Rates of High-Density Electron Hole Plasma in GaN and ZnO
Jae Seok Kim, | 한국물리학회 | 2007 ,
765
Sub-60-nm Lithography Patterns by Low-Energy Microcolumn Lithography
Sub-60-nm Lithography Patterns by Low-Energy Microcolumn Lithography
H. S. Kim, | 한국물리학회 | 2007 ,
766
Measurement of the Resonance Frequency, the Loss Factor, and the Dynamic Young's Modulus in Structural Steel and Polycarbonate by Using an Acoustic Velocity Sensor
Measurement of the Resonance Frequency, the Loss Factor, and the Dynamic Young's Modulus in Structural Steel and Polycarbonate by Using an Acoustic Velocity Sensor
Sung Soo Jung, | 한국물리학회 | 2006 ,
767
Effects of Process Parameter for LiNbO₃ Optical Waveguide Prepared by Neutral Loop Discharge Plasma Etching
Effects of Process Parameter for LiNbO₃ Optical Waveguide Prepared by Neutral Loop Discharge Plasma Etching
W. J. Park, | 한국물리학회 | 2006 ,
768
Study on a Partial Discharge Test fof Low-Voltage Electronic Components
Study on a Partial Discharge Test fof Low-Voltage Electronic Components
Gyung-Suk Kil, | 한국물리학회 | 2006 ,
769
CF₄-Based Neutral-Beam Etch Characteristics of Si and SiO₂Using a Low-Angle forward-Reflected Neutral-beam Etching System
CF₄-Based Neutral-Beam Etch Characteristics of Si and SiO₂Using a Low-Angle forward-Reflected Neutral-beam Etching System
D. H. Lee, | 한국물리학회 | 2006 ,
770
Hot Carrier Effect in Low-Temperature Poly-Si TFTs with Sputtered Gate SiO₂ Films
Hot Carrier Effect in Low-Temperature Poly-Si TFTs with Sputtered Gate SiO₂ Films
YuKiharu Uraoka, | 한국물리학회 | 2006 ,
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