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751
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Tae Seok Sim, | 대한전자공학회 | 2005 ,
752
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Fabrication, Estimation and Trypsin Digestion Experiment of the Thermally Isolated Micro Teactor for Bio-chemical Reation
Tae Seok Sim, | 대한전자공학회 | 2002 ,
753
Device Characterization and Fabrication issues for Ferroelectric Gate Field Effect Transistor Device
Device Characterization and Fabrication issues for Ferroelectric Gate Field Effect Transistor Device
Byoung-Gon Yu, | 대한전자공학회 | 2002 ,
754
MRAM Technology for High Density Memory Application
MRAM Technology for High Density Memory Application
Chang-Shuk Kim, | 대한전자공학회 | 2002 ,
755
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
A New EEPROM with Side Floating Gates having Different Work Function from Control Gate
Youngjoon Ahn, | 대한전자공학회 | 2002 ,
756
A Study on the Passive Microvalve Applicable to Drainage Device for Glaucoma
A Study on the Passive Microvalve Applicable to Drainage Device for Glaucoma
Tae Seok Sim, | 대한전자공학회 | 2002 ,
757
Piezoelectric PZT Cantilever Array Integrated with Piezoresistor for High Speed Operation and Calibration of Atomic Force Microscopy
Piezoelectric PZT Cantilever Array Integrated with Piezoresistor for High Speed Operation and Calibration of Atomic Force Microscopy
Young-Sik Kim, | 대한전자공학회 | 2002 ,
758
On-chip Smart Functions for Efficiency Enhancement of MMIC Power Amplifiers for W-CDMA Handset Applications
On-chip Smart Functions for Efficiency Enhancement of MMIC Power Amplifiers for W-CDMA Handset Applications
Youn S. Noh, | 대한전자공학회 | 2003 ,
759
40nm InGaAs HEMT's with 65% Strained Channel Fabricated with Damage-Free SiO2/SiNx Side-wall Gate Process
40nm InGaAs HEMT's with 65% Strained Channel Fabricated with Damage-Free SiO2/SiNx Side-wall Gate Process
Dae-Hyun Kim, | 대한전자공학회 | 2003 ,
760
Progress in Novel Oxides for Gate Dielectrics and Surface Passivation of GaN/A1GaN Heterostructure Field Effect Transistors
Progress in Novel Oxides for Gate Dielectrics and Surface Passivation of GaN/A1GaN Heterostructure Field Effect Transistors
C.R.Abernathy, | 대한전자공학회 | 2003 ,
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