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741
Dielectric and ac Conductivity Properties of Iodine-doped Poly (2-Enthynyl-N-Hexylpyridinum Bromide)
Dielectric and ac Conductivity Properties of Iodine-doped Poly (2-Enthynyl-N-Hexylpyridinum Bromide)
J. H. Cho, | 한국물리학회 | 2007 ,
742
Quantization of the current Induced by a Surface Acoustic Wave through a Quantum Point Contact
Quantization of the current Induced by a Surface Acoustic Wave through a Quantum Point Contact
Nam Kim, | 한국물리학회 | 2007 ,
743
Analysis on the Defects in the Molecular Structures of MgO Films Deposited with Different Evaporation Rates in Ac Plasma Display Panels
Analysis on the Defects in the Molecular Structures of MgO Films Deposited with Different Evaporation Rates in Ac Plasma Display Panels
Yong jae Kim, | 한국물리학회 | 2007 ,
744
Bremsstrahlung Radiation at a Vacuum Bubble Wall
Bremsstrahlung Radiation at a Vacuum Bubble Wall
Jae-Weon Lee, | 한국물리학회 | 2007 ,
745
Interdot Coupling in a Si-Based Coupled Double dot Device
Interdot Coupling in a Si-Based Coupled Double dot Device
S. J. Shin, | 한국물리학회 | 2007 ,
746
Effect of Tm³+ on the Strong Magnetic Anisotropy in the High-Tc Superconductor TmBa₂Cu₃Oy
Effect of Tm³+ on the Strong Magnetic Anisotropy in the High-Tc Superconductor TmBa₂Cu₃Oy
J. H. Lee, | 한국물리학회 | 2007 ,
747
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
Chang Young Kim, | 한국물리학회 | 2007 ,
748
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
749
Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Chemical and Nanomechanical Characteristics of fluorocarbon Thin Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Nam-Kyun Kim, | 한국물리학회 | 2007 ,
750
Study of SnO₂Nanorods Coated Using the PECVD Technique
Study of SnO₂Nanorods Coated Using the PECVD Technique
Hyoun Woo Kim, | 한국물리학회 | 2007 ,
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