본문

  1. Home
1000 Results:AA:C W CHAN 1.497 sec.
RSS 
Multilingual
 Расширенный поиск
 Новый поиск книги прибытия
Selected Print Select Export to Excel
621
Plasma Channel Generation for Electron Acceleration with a Laser-Induced Density Gradient
Plasma Channel Generation for Electron Acceleration with a Laser-Induced Density Gradient
Hyojae Jang, | 한국물리학회 | 2007 ,
622
A Study of Electro-Optical Crystal as a Diagnostic Tool for Low Energy Electron Beam
A Study of Electro-Optical Crystal as a Diagnostic Tool for Low Energy Electron Beam
Yong-Woon Parc, | 한국물리학회 | 2007 ,
623
China Spallation Neutron Source : Accelerator Design Iterations and R&D Status
China Spallation Neutron Source : Accelerator Design Iterations and R&D Status
Jie Wei, | 한국물리학회 | 2007 ,
624
Interface Resistance Switching Characteristics of Metal/Nb-doped SrTiO₃ Junctions
Interface Resistance Switching Characteristics of Metal/Nb-doped SrTiO₃ Junctions
Chanwoo Park, | 한국물리학회 | 2007 ,
625
Investigation of Solid-State Photomultipliers for Positron Emission Tomography Scanners
Investigation of Solid-State Photomultipliers for Positron Emission Tomography Scanners
Jae Sung Lee, | 한국물리학회 | 2007 ,
626
Combined Microchannel-Type Erythrocyte Deformability Test with Optical Tweezers : I. Basdic Principles
Combined Microchannel-Type Erythrocyte Deformability Test with Optical Tweezers : I. Basdic Principles
Won gu Lee, | 한국물리학회 | 2007 ,
627
The Growth Characteristics of a GaN Layer on a Cone-Shaped Patterned Sapphire Substrate by TEM Observation
The Growth Characteristics of a GaN Layer on a Cone-Shaped Patterned Sapphire Substrate by TEM Observation
Hui-Youn Shin, | 한국물리학회 | 2007 ,
628
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
Chang Young Kim, | 한국물리학회 | 2007 ,
629
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
630
Study of SnO₂Nanorods Coated Using the PECVD Technique
Study of SnO₂Nanorods Coated Using the PECVD Technique
Hyoun Woo Kim, | 한국물리학회 | 2007 ,
처음이전58596061626364656667이후마지막