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391
Structural and Optical Properties of SnO₂ Thin Films Deposited by Using CVD Techniques
Structural and Optical Properties of SnO₂ Thin Films Deposited by Using CVD Techniques
Jin Jeong., | 한국물리학회 | 2006 ,
392
Poing-Defect Study of CuAISe₂(112) Layers Post-Annealed in Various Ambient
Poing-Defect Study of CuAISe₂(112) Layers Post-Annealed in Various Ambient
Kwang-joon Hong., | 한국물리학회 | 2006 ,
393
Modal Characteristics in NRD and H-Guides with Lossy Dielectric Strips
Modal Characteristics in NRD and H-Guides with Lossy Dielectric Strips
Ryu, Young-ho, | 한국물리학회 | 2006 ,
394
Nonlinear Thomson Scattering for Attosecond X-ray Pulse Generation
Nonlinear Thomson Scattering for Attosecond X-ray Pulse Generation
Lee, Kitae, | 한국물리학회 | 2006 ,
395
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Cho, Kyu-chul, | 한국물리학회 | 2006 ,
396
Electrostatically Actuated Oscillator of Bundle and Double-Walled Carbon Nanotubes
Electrostatically Actuated Oscillator of Bundle and Double-Walled Carbon Nanotubes
Kang, Jeong Won, | 한국물리학회 | 2006 ,
397
Non-Special Atmosphere Synthesis for MgB₂
Non-Special Atmosphere Synthesis for MgB₂
Lee, H. B., | 한국물리학회 | 2006 ,
398
Fabrication and Properties of an Epitaxial AIN Film on a SiC Substrate by Using Reactive RF Magnetron Sputtering
Fabrication and Properties of an Epitaxial AIN Film on a SiC Substrate by Using Reactive RF Magnetron Sputtering
Kim, Kwang-ho, | 한국물리학회 | 2006 ,
399
Spatial Light Modulator Using Poly(Vinylidenefluoride-Trifluoroethylene-Chlorofluoroethylene) Terpolymer with a High Electrostrictive Strain
Spatial Light Modulator Using Poly(Vinylidenefluoride-Trifluoroethylene-Chlorofluoroethylene) Terpolymer with a High Electrostrictive Strain
Jeong, Dae-yong, | 한국물리학회 | 2006 ,
400
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Koo, Jaehyoung, | 한국물리학회 | 2006 ,
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