본문

  1. Home
398 Results:SS:PROCESS 0.140 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
11
Optimum Design of RDF Processing System Using RFTF Method
Optimum Design of RDF Processing System Using RFTF Method
Sung-Joo Lee, | 한구지구시스템공학회=한국자원공학회 | 2006 ,
12
Comparison of Two Acidic Leaching Processes for Selecting the Effective Recycle Process of Spent Lithium ion Battery
Comparison of Two Acidic Leaching Processes for Selecting the Effective Recycle Process of Spent Lithium ion Battery
Jeong-Soo Sohn., | 한구지구시스템공학회=한국자원공학회 | 2006 ,
13
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
Gon-ho Kim., | 한국물리학회 | 2006 ,
14
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
A 10-Gb/s Planar InGaAs/InP Avalanche Photodiode with a Thin Multiplication Layer Fabricated by Using Recess-Etching and Single-Diffusion Processes
Sungmin Hwang., | 한국물리학회 | 2006 ,
15
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Charmed Baryon Production from the Quark Coalescence Process in Au+Au Collisions at the RHIC
Byungsik Hong., | 한국물리학회 | 2006 ,
16
Self-Organized Process for Patterning of a Thin-Film Transistor
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-kwon Choo., | 한국물리학회 | 2006 ,
17
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
18
Novel Model for Film Formation in Plasma Processing
Novel Model for Film Formation in Plasma Processing
Leonid R. Shaginyan., | 한국물리학회 | 2006 ,
19
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Sang-kon Kim., | 한국물리학회 | 2006 ,
20
Understanding the Behaviors of Cu During a Post-Gate-Oxidation Device Process by Using an Isotope Tracking Analysis
Understanding the Behaviors of Cu During a Post-Gate-Oxidation Device Process by Using an Isotope Tracking Analysis
Sung-wook Lee., | 한국물리학회 | 2006 ,
처음이전12345678910이후마지막
1
Advanced Material and Processing
대한금속재료학회(구 대한금속학회) [기계공학, ]
2
Advanced Materials & Processes
ASM International [, ]
3
Applied Physics A: Materials Science & Processing
Springer - Verlag New York, Inc. [, ]
4
Bioprocess
Hans Publishing [, ]
5
European Journal of Mineral Processing & Environmental Protection
European Journal of Mineral Processing & Environmental Protection [, ]
6
Family Process
Family Process [, ]
7
Family Process
Family Process [, ]
8
Hydrocarbon Processing
Gulf Publishing [, ]
9
ICONIP : International Conference On Neural Information Processing
대한전자공학회 [, ]
10
ICONIP : International Conference On Neural Information Processing
대한전자공학회 [공학, ]
11
IEE Proceedings -- Vision, Image & Signal Processing
IEE [, ]
12
IEIE Transactions on Smart Processing & Computing
대한전자공학회 [, ]
13
IEIE Transactions on Smart Processing & Computing
대한전자공학회 [공학, ]
14
IET Image Processing
Institution of Engineering & Technology [, ]
15
International Journal of Computer Processing of Languages
World Scientific Publishing Company [, ]
16
International Journal of Computer Processing of Oriental Languages
World Scientific Publishing Company [, ]
17
International Journal of Wavelets, Multiresolution & Information Processing
World Scientific Publishing Company [, ]
18
Journal of information processing systems
한국정보처리학회 [전기공학·전자공학, ]
19
Journal of Integrated Design & Process Science
IOS Press [, ]
20
Mineral Processing & Extractive Metallurgy Review
Taylor & Francis Ltd [, ]