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171
A CMOS Bandgap Reference Voltage Generator for a CMOS Active Pixel Sensor Imager
A CMOS Bandgap Reference Voltage Generator for a CMOS Active Pixel Sensor Imager
Kwang Hyun Kim, | 한국전기전자재료학회 | 2005 ,
172
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Chang Joon Park, | 한국전기전자재료학회 | 2005 ,
173
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
174
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
175
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
176
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Chae Il Cheon, | 한국전기전자재료학회 | 2004 ,
177
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
178
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Sang Keuk Lee, | 한국전기전자재료학회 | 2003 ,
179
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Bok Hee Youn, | 한국전기전자재료학회 | 2003 ,
180
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
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