본문

  1. Home
1000 Results:AA:SEO C 0.488 sec.
RSS 
Multilingual
 Расширенный поиск
 Новый поиск книги прибытия
Selected Print Select Export to Excel
161
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Investigation of the Alignment Phenomena on the a-C:H Thin Films by PECVD System using Ion-beam Alignment Method
Chang Joon Park, | 한국전기전자재료학회 | 2005 ,
162
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
A Study on the Corrosion Effects by Addition of Complexing Agent in the Copper CMP Process
Sang Yong Kim, | 한국전기전자재료학회 | 2004 ,
163
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
EO Characteristic of the In-plane Driven VA Cells on a Polymer Layer
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
164
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
165
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Preparation of Low-Temperature Fired PZT Thick Films on Si by Screen Printing
Chae Il Cheon, | 한국전기전자재료학회 | 2004 ,
166
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Polymer Layer Effects on Anchoring Strength and Surface Ordering in NLC, 5CB, by the Washing Process after Rubbing on the Polyimide Surfaces
Sang Keuk Lee, | 한국전기전자재료학회 | 2004 ,
167
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Sang Keuk Lee, | 한국전기전자재료학회 | 2003 ,
168
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Bok Hee Youn, | 한국전기전자재료학회 | 2003 ,
169
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
170
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
처음이전12131415161718192021이후마지막