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141
Profile-based roughness discrimination with pen-type texture sensor
Profile-based roughness discrimination with pen-type texture sensor
Ye, X, | 제어자동화시스템공학회 | 2010 ,
142
Fiber Optic Sensor For In-Situ And Realtime Monitoring Of Transport Of Gas Phase Ozone In Unsaturated Porous Media
Fiber Optic Sensor For In-Situ And Realtime Monitoring Of Transport Of Gas Phase Ozone In Unsaturated Porous Media
Hae Ryong Jung, | 대한환경공학회 | 2005 ,
143
Characteristics of Surface Micromachined Pyroelectric Infrared Ray Focal Plane Array
Characteristics of Surface Micromachined Pyroelectric Infrared Ray Focal Plane Array
Sang-Ouk Ryu, | 대한전자공학회 | 2005 ,
144
Gate Tunneling Current and Quantum Effects in Deep Scaled MOSFETs
Gate Tunneling Current and Quantum Effects in Deep Scaled MOSFETs
Chang-Hoon Choi, | 대한전자공학회 | 2004 ,
145
Atomistic Simulation of the Effect of Dislocations on Temperature Rise during High-Strain-Rate Deformation
Atomistic Simulation of the Effect of Dislocations on Temperature Rise during High-Strain-Rate Deformation
Deok-Kee Choi, | 대한금속재료학회 | 2006 ,
146
Design of the Beam Line Elenents for Proton Computed Tomography
Design of the Beam Line Elenents for Proton Computed Tomography
Hyungjoon Ryu, | 한국물리학회 | 2007 ,
147
Interdot Coupling in a Si-Based Coupled Double dot Device
Interdot Coupling in a Si-Based Coupled Double dot Device
S. J. Shin, | 한국물리학회 | 2007 ,
148
Effect of Tm³+ on the Strong Magnetic Anisotropy in the High-Tc Superconductor TmBa₂Cu₃Oy
Effect of Tm³+ on the Strong Magnetic Anisotropy in the High-Tc Superconductor TmBa₂Cu₃Oy
J. H. Lee, | 한국물리학회 | 2007 ,
149
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
Chang Young Kim, | 한국물리학회 | 2007 ,
150
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
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