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1
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
Sung-jin Kim., | 한국물리학회 | 2006 ,
2
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
3
Nanoscale Lines Patterned by 1 : 1 Electron-Beam Projection Lithography Using an Electron Emission Mask
Nanoscale Lines Patterned by 1 : 1 Electron-Beam Projection Lithography Using an Electron Emission Mask
Kwang Nam Choi., | 한국물리학회 | 2006 ,
4
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Kang, Hye-young, | 한국물리학회 | 2006 ,
5
Fabrication of Nanostructured Films of Block Copolymers for Nanolithographical Masks
Fabrication of Nanostructured Films of Block Copolymers for Nanolithographical Masks
Dae-Ho Park, Byeong-Hyeok Sohn, Jin Chul Jung, W, | 한국마이크로전자및 패키징학회 | 2005 ,
6
Dewetting된 Pt Islands를 Etch Mask로 사용한 GaN, 나노구조 제작
Dewetting된 Pt Islands를 Etch Mask로 사용한 GaN, 나노구조 제작
김택승, 이지면, | 한국재료학회 | 2006 ,
7
Metal Mask 검사시스템
Metal Mask 검사시스템
최경진, 이영현, 박중국, | 대한전자공학회 | 2003 ,
8
Masks of Black Africa
Masks of Black Africa
Segy, Ladislas, 629.9-S456m-안진홍 | Dover Publications | 1976 629.9-S456m-안진홍,
9
Shadow Mask용 인바 합금의 특성 연구
Shadow Mask용 인바 합금의 특성 연구
정우창,이태호,김성준, | 대한금속.재료학회 | 2002 ,
10
Inventing masks : agency and history in the art of the Central Pende
Inventing masks : agency and history in the art of the Central Pende
Strother, Z.S., 381.39-S925i | University of Chicago Press | 1999 381.39-S925i,
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