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1
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
2
Plasma and Electrical Characteristics of a Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
Plasma and Electrical Characteristics of a Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
Kim, Kyong Nam, | 한국물리학회 | 2006 ,
3
Experimental Investigations of Pulse-Power-Modulated Inductive Discharges
Experimental Investigations of Pulse-Power-Modulated Inductive Discharges
Seo, Sang-hun, | 한국물리학회 | 2006 ,
4
Signal Transmission Properties of the Inductive Coupler using the High Permeability Magnetic Mterials
Signal Transmission Properties of the Inductive Coupler using the High Permeability Magnetic Mterials
Hyun-Sik Kim, | 한국전기전자재료학회 | 2006 ,
5
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
Yoon-Bong Hahn, Stephen J. Pearton, | 한국화학공학회 | 2000 ,
6
A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
S. C. Ahn, S. Y. Han, J. L. Lee, J. H. Moon, and, | 대한금속.재료학회 | 2004 ,
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