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1
Preparation of Polymer Thin Films of Pentafluorostyrene via Plasma Polymerization
Preparation of Polymer Thin Films of Pentafluorostyrene via Plasma Polymerization
C. J. Ahn., | 한국접착 및 계면학회 | 2006 ,
2
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Fucheng Yu., | 한국물리학회 | 2006 ,
3
Preparation and Characterization of PbTiO₃/Pb(Zr0.52Ti0.48)O₃ Heterolayered Thick Films by Screen-Printing
Preparation and Characterization of PbTiO₃/Pb(Zr0.52Ti0.48)O₃ Heterolayered Thick Films by Screen-Printing
Sung-gap Lee., | 한국물리학회 | 2006 ,
4
Crystallinity Effect of AlN Thin Films on the Frequency Response of an AlN/IDT/Si Surface Acoustic Wave Device
Crystallinity Effect of AlN Thin Films on the Frequency Response of an AlN/IDT/Si Surface Acoustic Wave Device
Soo Ho Kim., | 한국물리학회 | 2006 ,
5
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
6
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
7
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
8
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
9
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Rangaswamy Navamathavan., | 한국물리학회 | 2006 ,
10
Photochromic Mechanism in a-WO₃ Thin Films Based on Raman Spectroscopic Studies
Photochromic Mechanism in a-WO₃ Thin Films Based on Raman Spectroscopic Studies
Kyungmoon Kim., | 한국물리학회 | 2006 ,
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1
Film Comment
Film Society of Lincoln Center [, ]
2
Films in Review
National Board of Review of Motion Pictures Inc. [, ]