본문

  1. Home
83 Results:SS:FILM 0.218 sec.
RSS 
Multilingual
 חיפוש מתקדם
 חיפוש חדש ההגעה
Selected Print Select Export to Excel
1
Preparation of Polymer Thin Films of Pentafluorostyrene via Plasma Polymerization
Preparation of Polymer Thin Films of Pentafluorostyrene via Plasma Polymerization
C. J. Ahn., | 한국접착 및 계면학회 | 2006 ,
2
Characteristics of Electrowetting of Self-assembled Monolayer and Z-Tetraol Film
Characteristics of Electrowetting of Self-assembled Monolayer and Z-Tetraol Film
Li-Yu Lin., | 한국정밀공학회 | 2006 ,
3
Excitation Transport by the Resonant Dipole-Dipole Interaction in a Closely Packed Quantum-Dot Film
Excitation Transport by the Resonant Dipole-Dipole Interaction in a Closely Packed Quantum-Dot Film
Suc-kyoung Hong., | 한국물리학회 | 2006 ,
4
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Effects of Be-Codoping on the Properties of GaMnAs Films Grown via Low-Temperature Molecular Beam Epitaxy
Fucheng Yu., | 한국물리학회 | 2006 ,
5
Preparation and Characterization of PbTiO₃/Pb(Zr0.52Ti0.48)O₃ Heterolayered Thick Films by Screen-Printing
Preparation and Characterization of PbTiO₃/Pb(Zr0.52Ti0.48)O₃ Heterolayered Thick Films by Screen-Printing
Sung-gap Lee., | 한국물리학회 | 2006 ,
6
Crystallinity Effect of AlN Thin Films on the Frequency Response of an AlN/IDT/Si Surface Acoustic Wave Device
Crystallinity Effect of AlN Thin Films on the Frequency Response of an AlN/IDT/Si Surface Acoustic Wave Device
Soo Ho Kim., | 한국물리학회 | 2006 ,
7
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N₂O/NH₃ Gas
C. J. Chung., | 한국물리학회 | 2006 ,
8
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
9
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
10
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
처음123456789이후마지막
1
Film Comment
Film Society of Lincoln Center [, ]
2
Film Criticism
Film Criticism [, ]
3
Films in Review
National Board of Review of Motion Pictures Inc. [, ]
4
Journal of Popular Film & Television
Heldref Publications [, ]
5
Literature Film Quarterly
Salisbury State University [, ]
6
Velvet Light Trap: A Critical Journal of Film & Television
University of Texas Press [, ]