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Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process
Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process
Detailed Information
- Material Type
- 기사
- ISSN
- 10636536
- Author
- Arthur Tay
- Title/Author
- Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process / Arthur Tay ; Weng Khuen Ho, Xiaodong Wu
- Publish Info
- New York, NY : Institute of Electrical and Electronics Engineers, 2007.
- Material Info
- pp. 99-105
- General Note
- Indudes Bibiography Reference
- Added Entry-Personal Name
- Weng Khuen Ho, Xiaodong Wu
- Electronic Location and Access
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60263079
MARC
008201016s2007 ai aa eng■022 ▼a10636536
■1001 ▼aArthur Tay
■24510▼aReal-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process▼dArthur Tay▼eWeng Khuen Ho, Xiaodong Wu
■260 ▼aNew York, NY▼bInstitute of Electrical and Electronics Engineers▼c2007.
■300 ▼app. 99-105
■500 ▼aIndudes Bibiography Reference
■7001 ▼aWeng Khuen Ho, Xiaodong Wu
■773 ▼tIEEE transactions on control systems technology▼gVol. 15 No. 1 (2007. 1)▼d2007, 01
■856 ▼uhttps://www.ieee.org
■SIS ▼aS039797▼b60077650▼h8▼s2▼fP
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