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Aspects of Hard Breakdown Characteristics in a 2.2-nm-thick SiO_2 Film
Aspects of Hard Breakdown Characteristics in a 2.2-nm-thick SiO_2 Film
Detailed Information
- 자료유형
- 기사
- ISSN
- 15981657
- 저자명
- Komiya , Kenji
- 서명/저자
- Aspects of Hard Breakdown Characteristics in a 2.2-nm-thick SiO_2 Film / Komiya , Kenji , 공저 Oμra , Yasuhisa
- 발행사항
- 서울 : 대한전자공학회, 2002.
- 형태사항
- pp. 164-169
- 주기사항
- 권말 색인 및 참고문헌 수록
- 기타저자
- Oμra , Yasuhisa
- 기본자료저록
- Journal of Semiconductor Technology and Science : Volume 2, Number 3, (2002 September) 2002, 09
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60243004
MARC
008191113s2002 ulk aa eng■022 ▼a15981657
■1001 ▼aKomiya , Kenji
■24510▼aAspects of Hard Breakdown Characteristics in a 2.2-nm-thick SiO_2 Film▼dKomiya , Kenji ▼e공저 Oμra , Yasuhisa
■260 ▼a서울▼b대한전자공학회▼c2002.
■300 ▼app. 164-169
■500 ▼a권말 색인 및 참고문헌 수록
■7001 ▼aOμra , Yasuhisa
■773 ▼tJournal of Semiconductor Technology and Science▼gVolume 2, Number 3, (2002 September)▼d2002, 09
■856 ▼uhttp://www.jsts.org
■SIS ▼aS013695▼b60054120▼h8▼s2▼fP
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