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Enhanced - Inductively Coupled Plasma ( E - ICP ) 를 이용한 Silylated Photoresist 식각공정개발
Enhanced - Inductively Coupled Plasma ( E - ICP ) 를 이용한 Silylated Photoresist 식각공정개발
Detailed Information
- 자료유형
- 기사
- ISSN
- 12267945
- 저자명
- 조수범(Soo Beom Jo)
- 서명/저자
- Enhanced - Inductively Coupled Plasma ( E - ICP ) 를 이용한 Silylated Photoresist 식각공정개발 / 조수범(Soo Beom Jo) , 김진우(Chin Woo Kim) , 정재성(Jae Seong Jeong) , 오범환(Beom Hoan O) , 박세근(Se Geun Park) , 이종근(Jong Geun Lee) 공저
- 발행사항
- 서울 : 한국전기전자재료학회, 2002.
- 형태사항
- pp. 227-232
- 주기사항
- 참고문헌 수록
- 기타저자
- 김진우(Chin Woo Kim) , 정재성(Jae Seong Jeong) , 오범환(Beom Hoan O) , 박세근(Se Geun Park) , 이종근(Jong Geun Lee)
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60234397
MARC
008191008s2002 ulk aa kor■022 ▼a12267945
■1001 ▼a조수범(Soo Beom Jo)
■24510▼aEnhanced - Inductively Coupled Plasma ( E - ICP ) 를 이용한 Silylated Photoresist 식각공정개발▼d조수범(Soo Beom Jo) ▼e김진우(Chin Woo Kim) , 정재성(Jae Seong Jeong) , 오범환(Beom Hoan O) , 박세근(Se Geun Park) , 이종근(Jong Geun Lee) 공저
■260 ▼a서울▼b한국전기전자재료학회▼c2002.
■300 ▼app. 227-232
■500 ▼a참고문헌 수록
■7001 ▼a김진우(Chin Woo Kim) , 정재성(Jae Seong Jeong) , 오범환(Beom Hoan O) , 박세근(Se Geun Park) , 이종근(Jong Geun Lee)
■773 ▼t전기전자재료학회논문지(Journal of the korean Institute and Electronic▼g제15권 제3호 (2002년 3월)▼d2002, 03
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS014445▼b60055323▼h8▼s2▼fP
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