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The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film
The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film
Detailed Information
- Material Type
- 기사
- ISSN
- 12297607
- Author
- J. Y. Choi
- Title/Author
- The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film / J. Y. Choi ; G. E. Jang
- Publish Info
- 서울 : 한국전기전자재료학회, 2005.
- Material Info
- pp. 189-193
- General Note
- Includes Bibliography
- Added Entry-Personal Name
- G. E. Jang
- Host Item Entry
- Transactions on Electrical and Electronic Materials : Vol.5, No.5 (2004 October) 2005, 10
- Electronic Location and Access
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60232780
MARC
008190927s2005 ulk aa eng■022 ▼a12297607
■1001 ▼aJ. Y. Choi
■24510▼aThe Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film▼dJ. Y. Choi ▼eG. E. Jang
■260 ▼a서울▼b한국전기전자재료학회▼c2005.
■300 ▼app. 189-193
■500 ▼aIncludes Bibliography
■7001 ▼aG. E. Jang
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.5, No.5 (2004 October)▼d2005, 10
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS014510▼b60055341▼h8▼s2▼fP
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