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The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film
The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film / J. Y. Choi...
The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film

Detailed Information

자료유형  
 기사
ISSN  
12297607
저자명  
J. Y. Choi
서명/저자  
The Doping and Plasma Effects on Gas Sensing Properties of α-Fe2O3 Thin Film / J. Y. Choi , G. E. Jang
발행사항  
서울 : 한국전기전자재료학회, 2005.
형태사항  
pp. 189-193
주기사항  
Includes Bibliography
기타저자  
G. E. Jang
기본자료저록  
Transactions on Electrical and Electronic Materials : Vol.5, No.5 (2004 October) 2005, 10
원문정보  
 url
모체레코드  
모체정보확인
Control Number  
kjul:60232780

MARC

 008190927s2005        ulk                          aa    eng
■022    ▼a12297607
■1001  ▼aJ.  Y.  Choi
■24510▼aThe  Doping  and  Plasma  Effects  on  Gas  Sensing  Properties  of  α-Fe2O3  Thin  Film▼dJ.  Y.  Choi  ▼eG.  E.  Jang  
■260    ▼a서울▼b한국전기전자재료학회▼c2005.
■300    ▼app.  189-193
■500    ▼aIncludes  Bibliography
■7001  ▼aG.  E.  Jang
■773    ▼tTransactions  on  Electrical  and  Electronic  Materials▼gVol.5,  No.5  (2004  October)▼d2005,  10
■856    ▼uhttp://www.kieeme.or.kr
■SIS    ▼aS014510▼b60055341▼h8▼s2▼fP

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