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Plasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition
Plasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition
Detailed Information
- Material Type
- 기사
- ISSN
- 12297607
- Author
- Ji Gong Lee
- Title/Author
- Plasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition / Ji Gong Lee ; Sung Pil Lee
- Publish Info
- 서울 : 한국전기전자재료학회, 2005.
- Material Info
- pp. 98-103
- General Note
- Includes Bibliography
- Added Entry-Personal Name
- Sung Pil Lee
- Host Item Entry
- Transactions on Electrical and Electronic Materials : Vol.5, No.3 (2004 June) 2005, 06
- Electronic Location and Access
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60232768
MARC
008190927s2005 ulk aa eng■022 ▼a12297607
■1001 ▼aJi Gong Lee
■24510▼aPlasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition▼dJi Gong Lee ▼eSung Pil Lee
■260 ▼a서울▼b한국전기전자재료학회▼c2005.
■300 ▼app. 98-103
■500 ▼aIncludes Bibliography
■7001 ▼aSung Pil Lee
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.5, No.3 (2004 June)▼d2005, 06
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS014508▼b60055341▼h8▼s2▼fP
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