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Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Detailed Information
- 자료유형
- 기사
- ISSN
- 12297607
- 저자명
- Jeon Ho Kim
- 서명/저자
- Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode / Jeon Ho Kim , Kyu Jeong Choi , Nak Jin Seong , Soon Gil Yoon , Won Jae Lee , Jin Dong Kim , Woong Chul Shin , Sang Ouk Ryu , Sung Min Yoon , Byoung Gon Yu
- 발행사항
- 서울 : 한국전기전자재료학회, 2004.
- 형태사항
- pp. 34-40
- 주기사항
- Includes Bibliography
- 원문정보
- url
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60232708
MARC
008190927s2004 ulk aa eng■022 ▼a12297607
■1001 ▼aJeon Ho Kim
■24510▼aThermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode▼dJeon Ho Kim ▼e Kyu Jeong Choi , Nak Jin Seong , Soon Gil Yoon , Won Jae Lee , Jin Dong Kim , Woong Chul Shin , Sang Ouk Ryu , Sung Min Yoon , Byoung Gon Yu
■260 ▼a서울▼b한국전기전자재료학회▼c2004.
■300 ▼app. 34-40
■500 ▼aIncludes Bibliography
■7001 ▼aKyu Jeong Choi , Nak Jin Seong , Soon Gil Yoon , Won Jae Lee , Jin Dong Kim , Woong Chul Shin , Sang Ouk Ryu , Sung Min Yoon , Byoung Gon Yu
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.4, No.3 (2003 June)▼d2004, 06
■856 ▼uhttp://www.kieeme.or.kr
■SIS ▼aS014502▼b60055341▼h8▼s2▼fP
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